Advanced Pattern Imprint allows the use of Basic Pattern Powers much closer to Amber, all the way up to the foot Mt. Kolvir rather than 40mi away. The range and effect of those powers are also increased.

The user can bring up the Sign of the Pattern and concentrate on mentally walking it as if they were walking the Pattern itself. It takes about 10 minutes to complete the walk and is almost as exhausting mentally as walking the real Pattern is exhausting physically. Once completed the user can teleport anywhere in shadow as if they had walked the Pattern. This action breaks their concentration however and they lose the Sign of the Pattern. It costs Drama Points to Mindwalk the Pattern.

After Mindwalking the Pattern, rather than teleporting the user can look through the Pattern into shadow searching it for signs of Pattern, Chaos, Shadow Disruptions (Storms, Hellrides, Use of Advanced Pattern Edit Laws and Erase Shadow). The lens can also be used to search for other items but it takes longer.

The character can make changes to change various inanimate aspects of the Shadow as well as physical and chemical laws much like with Effect Shadow Rules but on a grander scale and quicker. The area effected starts small and localized to the character and moves outward eventually effecting the entire shadow. While concentration is no longer required at the level of Effect Shadow Rules the character must remain in the shadow, actively willing the change, and avoiding other uses of power or the area of effect stops growing. It can take several months to change the laws of an entire shadow. Depending on the reality of a shadow the laws may begin to revert back to their original state.

The character can change the factors that make a shadow what it is (see techs.html). This takes a lot of time and drama points.